基于CCD高速攝影儀的直流電弧實驗研究
滿家健，吳翊，楊飛，孫玉書，馬瑞光，吳益飛
(西安交通大學 電力設備電氣絕緣國家重點實驗室，陜西 西安 710049)
摘 要： 針對大容量中壓直流斷路器故障電流開斷過程，利用CCD 高速攝影裝置對電弧運動過程進行了影像捕捉。該實驗是在1 400 V 直流開斷實驗平臺上完成，分別在矩形和V 型兩種不同滅弧室結構下進行直流斷路器開斷實驗，并對比兩者的開斷特性。結果發現滅弧室結構對滅弧性能有重要影響，矩形滅弧室與V 型滅弧室對燃弧過程的影響差別很大。通過檢測電弧影像的實驗研究對大容量中壓直流斷路器的設計具有重要的指導意義。
關鍵詞： 中壓直流斷路器；高速攝影儀；大容量開斷；電弧形態；實驗研究
中圖分類號：TM561 文獻標識碼：B 文章編號：1007-3175(2015)07-0038-05
Experimental Research of DC-Arc Based on CCD High-Speed Cinetoscope
MAN Jia-jian, WU Yi, YANG Fei, SUN Yu-shu, MA Rui-guang, WU Yi-fei
（State Key Laboratory of Electrical Insulation and Power Equipment, Xi’an Jiaotong University, Xi’an 710049, China）
Abstract: In allusion to the fault current breaking process of high-capacity medium-voltage DC circuit breaker, images of arc motion were captured by CCD high-speed cinetoscope. The experiment was completed on 1 400 V DC breaking platform. Experiments were carried out on DC circuit breaker with rectangular interrupter and ‘V’ interrupter, and the breaking performances were compared. The results show that the structure of interrupter has an important influence on quenching performance. The rectangular interrupter and ‘V’interrupter were different in arcing process. The research on arc-image capture has important directive significance in design of highcapacity medium-voltage DC circuit breaker.
Key words: medium-voltage DC circuit breaker; high-speed cinetoscope; high-capacity making and breaking; arc shape; experimental research
參考文獻
[1] 馬釗.直流斷路器的研發現狀及展望[J].智能電網，2013，1(1)：12-16.
[2] 賀開華，彭海波.直流斷路器大容量試驗室的現狀與進展[J].船電技術，2010，30(9)：55-57.
[3] 孫昊，榮命哲，馬瑞光，等.空氣介質直流斷路器的現狀[J].低壓電器，2013(20)：8-10.
[4] 蔡彬，陳德桂.軌道交通的直流供電系統[J].電工技術雜志，2001(2)：10-13.
[5] 楊飛.空氣介質中壓直流大電流快速開斷技術的研究[D].西安：西安交通大學，2010.
[6] 寧嘉琦，孫昊，紐春萍，王海燕，楊飛，吳翊，榮命哲.空氣直流斷路器開斷特性試驗研究[J].低壓電器，2013(21)：5-8.
[7] 榮命哲，楊飛，吳翊，孫昊，李陽，紐春萍. 直流斷路器電弧研究的新進展[J]. 電工技術學報，2014，29(1)：1-9.
[8] 滿家健，紐春萍，謝成，吳翊，榮命哲，程玉標.雙斷點塑殼斷路器操作機構動作特性分析[J].低壓電器，2013(23)：1-4.
[9] Song X, Shi Z, Liu C, et al. Experimental investigation on the characteristics of vacuum arc in the process of DC interruption based on artificial current zero[C]//Isdeiv 2010：24th International Symposium on Discharges and Electrical Insulation in Vacuum, 2010.
[10] Wu Y, Rong MZ, Sun ZQ, et al. Numerical analysis of arc plasma behaviour during contact opening process in low-voltage switching device[J]. Journal of Physics D: Applied Physics, 2007, 40(3)：795-802.
